Invention Grant
- Patent Title: Method and apparatus for forming on a substrate a pattern of a material
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Application No.: US14436829Application Date: 2012-10-31
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Publication No.: US10588221B2Publication Date: 2020-03-10
- Inventor: Dror Kella , Eyal Negreanu , Gideon Amir , Mark Sandler , Yaron Grinwald
- Applicant: HEWLETT-PACKARD INDIGO B.V.
- Applicant Address: NL Amstelveen
- Assignee: HP Indigo B.V.
- Current Assignee: HP Indigo B.V.
- Current Assignee Address: NL Amstelveen
- Agency: HP Inc. Patent Department
- International Application: PCT/EP2012/071638 WO 20121031
- International Announcement: WO2014/067578 WO 20140508
- Main IPC: G03G15/00
- IPC: G03G15/00 ; H05K3/20 ; H05K3/12 ; G03G15/24

Abstract:
A method for forming on a substrate (108; 214) a pattern of a material, the method comprising: providing (S100) a material layer (104); providing (S104, S106) an adhesive layer (106), wherein at least one of the material layer (104) or the adhesive layer (106) comprises a pattern corresponding to the pattern to be formed on the substrate (108; 214); and transferring (S108) the material to the substrate (108; 214) with the adhesive fixing the material to a surface (110; 216) of the substrate (108; 214). This solves the problem of forming on a substrate a pattern of a material that, in general, cannot be applied to the substrate directly due to the fact that the material cannot be printed and/or has no or reduced adherence properties with respect to the substrate.
Public/Granted literature
- US20150351250A1 METHOD AND APPARATUS FOR FORMING ON A SUBSTRATE A PATTERN OF A MATERIAL Public/Granted day:2015-12-03
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