Invention Grant
- Patent Title: Analysis system and analysis method
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Application No.: US16406478Application Date: 2019-05-08
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Publication No.: US10591427B2Publication Date: 2020-03-17
- Inventor: Tomonori Nakamura , Nobuyuki Hirai
- Applicant: HAMAMATSU PHOTONICS K.K.
- Applicant Address: JP Hamamatsu-shi, Shizuoka
- Assignee: HAMAMATSU PHOTONICS K.K.
- Current Assignee: HAMAMATSU PHOTONICS K.K.
- Current Assignee Address: JP Hamamatsu-shi, Shizuoka
- Agency: Drinker Biddle & Reath LLP
- Main IPC: G01N25/72
- IPC: G01N25/72 ; G01N17/00 ; G01J5/00 ; G01R31/265 ; G01R31/02 ; G01R31/311

Abstract:
A heat source position inside a measurement object is identified with high accuracy by improving time resolution.An analysis system according to the present invention is an analysis system that identifies a heat source position inside a measurement object, and includes a condition setting unit that sets a measurement point for one surface of the measurement object, a tester that applies a stimulation signal to the measurement object, a light source that irradiates the measurement point of the measurement object with light, a photo detector that detects light reflected from a predetermined measurement point on the surface of the measurement object according to the irradiation of light and outputs a detection signal, and an analysis unit that derives a distance from the measurement point to the heat source position based on the detection signal and the stimulation signal and identifies the heat source position.
Public/Granted literature
- US20190265179A1 ANALYSIS SYSTEM AND ANALYSIS METHOD Public/Granted day:2019-08-29
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