Invention Grant
- Patent Title: Method of determining the deflection of an electron beam resulting from an electric field and/or a magnetic field
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Application No.: US15703557Application Date: 2017-09-13
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Publication No.: US10593511B2Publication Date: 2020-03-17
- Inventor: Benedikt Haas , David Cooper , Jean-Luc Rouviere
- Applicant: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES
- Applicant Address: FR Paris
- Assignee: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES
- Current Assignee: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES
- Current Assignee Address: FR Paris
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: FR1658594 20160914
- Main IPC: H01J37/244
- IPC: H01J37/244 ; H01J37/26 ; H01J37/295 ; G01N23/20058 ; G01N23/2055 ; G01R33/02 ; G01N27/06 ; G01R29/08

Abstract:
A method of determining a local electric field and/or a local magnetic field in a sample and/or the dielectric constant of a material and/or the angle between the input and output surfaces of the sample, comprising illumination of the sample by an electron beam in precession mode using an illumination device, generation of a diffraction pattern, determination of the offset of the disk corresponding to the transmitted beam due to the electric field and/or the magnetic field, by comparison of the diffraction pattern and a reference diffraction pattern, determination of a deflection angle of the transmitted beam, and determination of the value of the local electric field and/or the local magnetic field of the sample and/or determination of the dielectric constant of materials and/or determination of the angle between the input and output surfaces of the sample.
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