Invention Grant
- Patent Title: Vertical cavity surface emitting laser, method for fabricating vertical cavity surface emitting laser
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Application No.: US16189794Application Date: 2018-11-13
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Publication No.: US10594110B2Publication Date: 2020-03-17
- Inventor: Kei Fujii , Toshiyuki Tanahashi , Takashi Ishizuka , Susumu Yoshimoto , Takamichi Sumitomo , Koji Nishizuka , Suguru Arikata
- Applicant: SUMITOMO ELECTRIC INDUSTRIES, LTD.
- Applicant Address: JP Osaka
- Assignee: SUMITOMO ELECTRIC INDUSTRIES, LTD.
- Current Assignee: SUMITOMO ELECTRIC INDUSTRIES, LTD.
- Current Assignee Address: JP Osaka
- Agency: Smith, Gambrell & Russell, LLP.
- Priority: JP2017-220875 20171116
- Main IPC: H01S5/00
- IPC: H01S5/00 ; H01S5/183 ; H01S5/30 ; H01S5/343 ; H01S5/042

Abstract:
A vertical cavity surface emitting laser includes: a supporting base having a principal surface including III-V compound semiconductor containing gallium and arsenic as constituent elements; and a post disposed on the principal surface. The post has a lower spacer region including a III-V compound semiconductor containing gallium and arsenic as group-III elements, and an active layer having a quantum well structure disposed on the lower spacer region. The quantum well structure has a concentration of carbon in a range of 2×1016 cm−3 or more to 5×1016 cm−3 or less. The quantum well structure includes a well layer and a barrier layer. The well layer includes a III-V compound semiconductor containing indium as a group-III element, and the barrier layer includes a III-V compound semiconductor containing indium and aluminum as group-III elements. The lower spacer region is disposed between the supporting base and the active layer.
Public/Granted literature
- US20190148914A1 VERTICAL CAVITY SURFACE EMITTING LASER, METHOD FOR FABRICATING VERTICAL CAVITY SURFACE EMITTING LASER Public/Granted day:2019-05-16
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