Invention Grant
- Patent Title: Functionally graded material by in-situ gradient alloy sputter deposition management
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Application No.: US15907838Application Date: 2018-02-28
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Publication No.: US10597772B2Publication Date: 2020-03-24
- Inventor: Hans-Juergen Eickelmann , Thorsten Muehge , Erik Rueger , Markus Schmidt
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Lieberman & Brandsdorfer, LLC
- Main IPC: C23C14/34
- IPC: C23C14/34 ; C23C14/54 ; C23C14/02 ; H01J37/32 ; H01J37/34

Abstract:
Embodiments relate to a sputter chamber with a configurable surface in communication with a target material. A control system is in communication with the chamber and functions to prepare an alloy film by changing a composition of the configurable surface. As ingress gas is introduced to the chamber to interact with the changed composition, the interaction causes a reaction that produces an alloy film.
Public/Granted literature
- US20180187301A1 Functionally Graded Material By In-Situ Gradient Alloy Sputter Deposition Management Public/Granted day:2018-07-05
Information query
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