Invention Grant
- Patent Title: Method and device for inspecting spatial light modulator, and exposure method and device
-
Application No.: US16390058Application Date: 2019-04-22
-
Publication No.: US10598606B2Publication Date: 2020-03-24
- Inventor: Tomoharu Fujiwara
- Applicant: Nikon Corporation
- Applicant Address: JP Tokyo
- Assignee: NIKON CORPORATION
- Current Assignee: NIKON CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Shapiro, Gabor and Rosenberger, PLLC
- Priority: JP2011-191319 20110902
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G01N21/95 ; G02B26/06 ; G03F7/20 ; G01N21/55 ; G06T7/00

Abstract:
A method for inspecting a spatial light modulator includes: performing such control that in an inspection target area in an array of mirror elements, the mirror elements in a first state in which incident light is given a phase change amount of 0 and the mirror elements in a second state in which incident light is given a phase change amount of 180° (π) become arrayed in a checkered pattern; guiding light having passed the inspection target area to a projection optical system with a resolution limit coarser than a width of an image of one mirror element, to form a spatial image; and inspecting a characteristic of the spatial light modulator from the spatial image. This method allows us to readily perform the inspection of the characteristic of the spatial light modulator having the array of optical elements.
Public/Granted literature
- US10557801B2 Method and device for inspecting spatial light modulator, and exposure method and device Public/Granted day:2020-02-11
Information query