Invention Grant
- Patent Title: Glass substrate for mask blank, mask blank and photomask
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Application No.: US15881968Application Date: 2018-01-29
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Publication No.: US10599031B2Publication Date: 2020-03-24
- Inventor: Yuzo Okamura
- Applicant: AGC Inc.
- Applicant Address: JP Chiyoda-ku
- Assignee: AGC Inc.
- Current Assignee: AGC Inc.
- Current Assignee Address: JP Chiyoda-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2017-014710 20170130
- Main IPC: G03F1/60
- IPC: G03F1/60 ; B32B17/06 ; G03F1/22 ; G03F1/54 ; G03F1/24 ; G03F1/52
Abstract:
A glass substrate for a mask blank includes a first surface and a second surface. The first surface and second surface face each other. Each of the first surface and the second surface is approximately square having a vertical length and a horizontal length being equal to the vertical length. The first surface of the glass substrate has specific profile properties.
Public/Granted literature
- US20180217492A1 GLASS SUBSTRATE FOR MASK BLANK, MASK BLANK AND PHOTOMASK Public/Granted day:2018-08-02
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