Invention Grant
- Patent Title: Topography simulation of etching and/or deposition on a physical structure
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Application No.: US15360568Application Date: 2016-11-23
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Publication No.: US10599789B2Publication Date: 2020-03-24
- Inventor: Peter Regli , Giovanni Bozza
- Applicant: Synopsys, Inc.
- Applicant Address: US CA Mountain View
- Assignee: Synopsys, Inc.
- Current Assignee: Synopsys, Inc.
- Current Assignee Address: US CA Mountain View
- Agency: Park, Vaughan, Fleming & Dowler LLP
- Agent Laxman Sahasrabuddhe
- Main IPC: G06F17/50
- IPC: G06F17/50 ; H01L21/027

Abstract:
Systems and techniques are described for topography simulation of etching and/or deposition on a physical structure. The structural information can be represented using a three-dimensional (3D) voxel grid data structure. For each particle emitted by a Monte-Carlo particle emission model, a topographical modification caused by the particle can be determined by (1) calculating fluxes, (2) evaluating surface reactions, and (3) modifying the physical structure. The effect of the etching and/or deposition on a physical structure can be displayed by rendering the 3D voxel grid data structure.
Public/Granted literature
- US20170147724A1 TOPOGRAPHY SIMULATION OF ETCHING AND/OR DEPOSITION ON A PHYSICAL STRUCTURE Public/Granted day:2017-05-25
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