Invention Grant
- Patent Title: Inspection method and inspection apparatus
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Application No.: US15605292Application Date: 2017-05-25
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Publication No.: US10600176B2Publication Date: 2020-03-24
- Inventor: Hideo Tsuchiya
- Applicant: NUFLARE TECHNOLOGY, INC.
- Applicant Address: JP Yokohama-shi
- Assignee: NUFLARE TECHNOLOGY, INC.
- Current Assignee: NUFLARE TECHNOLOGY, INC.
- Current Assignee Address: JP Yokohama-shi
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2016-112198 20160603
- Main IPC: G06T9/00
- IPC: G06T9/00 ; G06T7/00 ; G06K9/20 ; G06K9/40 ; G06K9/46 ; G06K9/62

Abstract:
An inspection method according to the embodiments includes applying light of a light source to an inspection target; receiving light from the inspection target to obtain a first image of the inspection target by a sensor; based on an image of a first pattern comprising repetitive patterns unresolvable with a wavelength of the light source in the first image, calculating a deviation of luminance values with respect to each of first regions in the first pattern by a processor; obtaining a second image of the inspection target by the sensor; correcting luminance values of the second image by the processor based on the deviations of the luminance values; and comparing the repetitive patterns of the corrected second image with each other by a comparer.
Public/Granted literature
- US20170352142A1 INSPECTION METHOD AND INSPECTION APPARATUS Public/Granted day:2017-12-07
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