Invention Grant
- Patent Title: Permanent magnet comprising a stack of N patterns
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Application No.: US15480741Application Date: 2017-04-06
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Publication No.: US10600538B2Publication Date: 2020-03-24
- Inventor: Bertrand Delaet , Sophie Giroud , Rachid Hida
- Applicant: Commissariat a l'energie atomique et aux energies alternatives
- Applicant Address: FR Paris
- Assignee: Commissariat a l'energie atomique et aux energies alternatives
- Current Assignee: Commissariat a l'energie atomique et aux energies alternatives
- Current Assignee Address: FR Paris
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: FR1653013 20160406
- Main IPC: H01F1/047
- IPC: H01F1/047 ; G01R33/038 ; H01F41/02 ; H01F10/16 ; H01F10/30 ; H01F10/00 ; G01R33/00 ; H01F10/14

Abstract:
A permanent magnet includes a stack of N patterns stacked immediately one above the other in a stacking direction, each pattern including an antiferromagnetic layer made of antiferromagnetic material, a ferromagnetic layer made of ferromagnetic material, the directions of magnetization of the various ferromagnetic layers of all the patterns all being identical to one another. At least one ferromagnetic layer includes a first sub-layer made of CoFeB whose thickness is greater than 0.05 nm, and a second sub-layer made of a ferromagnetic material different from CoFeB and whose thickness is greater than the thickness of the first sub-layer.
Public/Granted literature
- US20170294253A1 PERMANENT MAGNET COMPRISING A STACK OF N PATTERNS Public/Granted day:2017-10-12
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