Invention Grant
- Patent Title: Focus ring with uneven pattern and plasma-processing apparatus including the same
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Application No.: US15682854Application Date: 2017-08-22
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Publication No.: US10600622B2Publication Date: 2020-03-24
- Inventor: Jaeseong Shin
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si, Gyeonggi-do
- Assignee: SAMUSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMUSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do
- Agency: Lee IP Law, P.C.
- Priority: KR10-2017-0001317 20170104
- Main IPC: H01J37/32
- IPC: H01J37/32 ; H01L21/3065
Abstract:
A focus ring includes a main body and a plurality of unit structures. The main body has a ring shape. The unit structures are arranged in an uneven pattern and protrude from an upper surface of the main body.
Public/Granted literature
- US20180190475A1 FOCUS RING AND PLASMA-PROCESSING APPARATUS INCLUDING THE SAME Public/Granted day:2018-07-05
Information query
