- Patent Title: Film bulk acoustic resonator with spurious resonance suppression
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Application No.: US15789109Application Date: 2017-10-20
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Publication No.: US10601391B2Publication Date: 2020-03-24
- Inventor: Robert B. Stokes , Alvin M. Kong , Liping Daniel Hou , Dae-Jin Hyun , Shing-Kuo Wang
- Applicant: Global Communication Semiconductors, LLC
- Applicant Address: US CA Torrance
- Assignee: GLOBAL COMMUNICATION SEMICONDUCTORS, LLC.
- Current Assignee: GLOBAL COMMUNICATION SEMICONDUCTORS, LLC.
- Current Assignee Address: US CA Torrance
- Agency: Morgan, Lewis & Bockius LLP
- Main IPC: H03H9/02
- IPC: H03H9/02 ; H03H9/13 ; H03H3/02

Abstract:
Devices and processes for preparing devices are described for reducing resonance of spurious waves in a bulk acoustic resonator. A first electrode is coupled to a first side of a piezoelectric layer and a second electrode is coupled to a second side of the piezoelectric layer. The piezoelectric layer is configured to resonate in response to an electrical signal applied between the first electrode and the second electrode. Perforations in the first electrode, the piezoelectric layer and/or the second electrode, and/or posts or beams supporting the second electrode, reduce resonance of spurious waves.
Public/Granted literature
- US20180138885A1 Film Bulk Acoustic Resonator with Spurious Resonance Suppression Public/Granted day:2018-05-17
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