Invention Grant
- Patent Title: Resist composition and patterning process
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Application No.: US15920746Application Date: 2018-03-14
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Publication No.: US10606172B2Publication Date: 2020-03-31
- Inventor: Jun Hatakeyama , Masaki Ohashi
- Applicant: SHIN-ETSU CHEMICAL CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2017-052391 20170317
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/38 ; G03F7/039 ; G03F7/038 ; G03F7/16 ; G03F7/32 ; G03F7/20 ; C08F220/20 ; C08F220/38 ; C08F220/16 ; C08F222/24 ; C08F222/14 ; C08F220/24 ; C08F220/26 ; C08F222/16 ; C08F228/02 ; C08F222/20 ; C08F224/00 ; C08F220/28 ; C08F220/22 ; C08F222/18 ; C07C309/04 ; C07C309/39 ; C07C303/32 ; C07C309/06 ; C07C309/07 ; C07C69/635 ; C08F220/30
Abstract:
A resist composition comprising a base polymer and a quencher in the form of an iodonium salt capable of generating fluorobenzoic acid bonded to iodized benzene offers a high sensitivity and minimal LWR independent of whether it is of positive or negative tone.
Public/Granted literature
- US20180267403A1 RESIST COMPOSITION AND PATTERNING PROCESS Public/Granted day:2018-09-20
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