Invention Grant
- Patent Title: Nano deposition and ablation for the repair and fabrication of integrated circuits
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Application No.: US15397141Application Date: 2017-01-03
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Publication No.: US10607899B2Publication Date: 2020-03-31
- Inventor: Shawn A. Adderly , Jeffrey P. Gambino , Eric A. Joseph , Anthony C. Speranza
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Schmeiser, Olsen & Watts
- Agent Alvin Borromeo
- Main IPC: H01L21/67
- IPC: H01L21/67 ; H01L21/66 ; H01L21/768 ; H01J37/32 ; H05H1/24 ; C23C16/04 ; C23C16/513 ; G01N23/2252 ; H01L21/48
Abstract:
An apparatus for and methods of repairing and manufacturing integrated circuits using the apparatus. The apparatus, comprising: a vacuum chamber containing: a movable stage configured to hold a substrate; an inspection and analysis probe; a heat source; a gas injector; and a gas manifold connecting multiple gas sources to the gas injector.
Public/Granted literature
- US20170117195A1 NANO DEPOSITION AND ABLATION FOR THE REPAIR AND FABRICATION OF INTEGRATED CIRCUITS Public/Granted day:2017-04-27
Information query
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