A vaporization supply apparatus comprises a vaporizer which heats and vaporize a liquid, a flow-rate control device which controls a flow rate of a gas sent out from the vaporizer, a first control valve interposed in a supply channel of a liquid to the vaporizer, a pressure detector for detecting a pressure of a gas vaporized by the vaporizer, a liquid detection part for measuring parameters of a liquid in an amount higher than a predetermined amount in the vaporizer, and a control device which controls the first control valve to supply a predetermined amount of a liquid to the vaporizer based on the pressure value detected by the pressure detector, and to close the first control valve when the liquid detection part detect a liquid in an amount higher than the predetermined amount.