Invention Grant
- Patent Title: Chemical-mechanical polishing composition comprising benzotriazole derivatives as corrosion inhibitors
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Application No.: US14905703Application Date: 2014-07-01
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Publication No.: US10647900B2Publication Date: 2020-05-12
- Inventor: Robert Reichardt , Martin Kaller , Michael Lauter , Yuzhuo Li , Andreas Klipp
- Applicant: BASF SE
- Applicant Address: DE Ludwigshafen
- Assignee: BASF SE
- Current Assignee: BASF SE
- Current Assignee Address: DE Ludwigshafen
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@6d4b2f9c
- International Application: PCT/IB2014/062747 WO 20140701
- International Announcement: WO2015/004567 WO 20150115
- Main IPC: C09G1/00
- IPC: C09G1/00 ; C09G1/02 ; C09G1/04 ; C09K3/14 ; H01L21/02 ; H01L21/304 ; H01L21/306 ; H01L21/321 ; H01L21/461
Abstract:
A chemical-mechanical polishing (CMP) composition is provided comprising (A) one or more compounds selected from the group of benzotriazole derivatives which act as corrosion inhibitors and (B) inorganic particles, organic particles, or a composite or mixture thereof. The invention also relates to the use of certain compounds selected from the group of benzotriazole derivatives as corrosion inhibitors, especially for increasing the selectivity of a chemical mechanical polishing (CMP) composition for the removal of tantalum or tantalum nitride from a substrate for the manufacture of a semiconductor device in the presence of copper on said substrate.
Public/Granted literature
- US20160200943A1 CHEMICAL-MECHANICAL POLISHING COMPOSITION COMPRISING BENZOTRIAZOLE DERIVATIVES AS CORROSION INHIBITORS Public/Granted day:2016-07-14
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