Invention Grant
- Patent Title: Method and system for measuring photothermal deflection
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Application No.: US16046597Application Date: 2018-07-26
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Publication No.: US10648903B2Publication Date: 2020-05-12
- Inventor: Tzong-Rong Ger , Shyh-Liang Lou , Szu-Yu Lin
- Applicant: Chung Yuan Christian University
- Applicant Address: TW Taoyuan
- Assignee: CHUNG YUAN CHRISTIAN UNIVERSITY
- Current Assignee: CHUNG YUAN CHRISTIAN UNIVERSITY
- Current Assignee Address: TW Taoyuan
- Agency: Lanway IPR Services
- Agent Chun-Ming Shih
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@587002cc
- Main IPC: G01N21/17
- IPC: G01N21/17 ; G01K17/02 ; G01K17/00

Abstract:
A photothermal deflection measuring system includes a substrate, a detecting light source, a detecting unit, and a processor. The substrate includes a plurality of positioning structures, on each of which supports a cell emitting heat outside a surface thereof. The detecting light source is utilized to project a detecting light passing through a specific position outside the surface whereby the detecting light is deflected due to a thermal gradient caused by the emitted heat. The detecting unit is arranged at a side of the cell for receiving the deflected detecting light thereby generating an optical deflection signal corresponding to a deflection of the deflected detecting light. The processor is configured to receive the optical deflection signal, analyze the optical deflection signal and determine a heat value corresponding to the specific position out side the surface of the cell according to the optical deflection signal.
Public/Granted literature
- US20190033200A1 METHOD AND SYSTEM FOR MEASURING PHOTOTHERMAL DEFLECTION Public/Granted day:2019-01-31
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