Invention Grant
- Patent Title: Semiconductor device
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Application No.: US15745568Application Date: 2016-09-21
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Publication No.: US10651038B2Publication Date: 2020-05-12
- Inventor: Yusuke Fukuda
- Applicant: SHINDENGEN ELECTRIC MANUFACTURING CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: SHINDENGEN ELECTRIC MANUFACTURING CO., LTD.
- Current Assignee: SHINDENGEN ELECTRIC MANUFACTURING CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Nixon & Vanderhye P.C.
- International Application: PCT/JP2016/077826 WO 20160921
- International Announcement: WO2018/055693 WO 20180329
- Main IPC: H01L29/15
- IPC: H01L29/15 ; H01L21/28 ; H01L23/00 ; H01L29/45 ; H01L21/04 ; H01L29/872 ; H01L29/47

Abstract:
A semiconductor device includes: a semiconductor layer of silicon carbide including a plurality of layers disposed on a main surface side; an electrode layer that is one of the plurality of layers, wherein the electrode layer has an electrode connecting surface to which a conductive connecting member is connected, and the electrode layer is composed mainly of silver; and a first metal layer that is a layer, different from the electrode layer, among the plurality of layers, wherein the first metal layer has a first bonding surface bonded onto the electrode layer such that the electrode connecting surface is exposed to an outside, and a second bonding surface electrically connected to the semiconductor layer, and the first metal layer is composed mainly of titanium carbide.
Public/Granted literature
- US20190006181A1 SEMICONDUCTOR DEVICE Public/Granted day:2019-01-03
Information query
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