Invention Grant
- Patent Title: Substrate treatment device and substrate treatment method
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Application No.: US16115757Application Date: 2018-08-29
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Publication No.: US10651064B2Publication Date: 2020-05-12
- Inventor: Hideji Naohara , Hiroaki Kakuma , Yuji Okita , Tatsuya Masui
- Applicant: SCREEN Holdings Co., Ltd.
- Applicant Address: JP Kyoto
- Assignee: SCREEN Holdings Co., Ltd.
- Current Assignee: SCREEN Holdings Co., Ltd.
- Current Assignee Address: JP Kyoto
- Agency: Ostrolenk Faber LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@23a90fd0
- Main IPC: H01L21/67
- IPC: H01L21/67 ; G06T7/00 ; H01L21/687

Abstract:
A substrate treatment device includes: a substrate rotation part that horizontally holds and rotates a substrate; a nozzle that supplies a treatment liquid to a surface to be treated of the substrate rotated by the substrate rotation part; an imaging part that captures an image of an imaging area including a plurality of target areas in which a liquid film is formed when the treatment liquid is supplied to the substrate; and a detection part that refers to an imaging result of the imaging part and detects a treatment ending time point of each of the target areas based on a change in luminance value for each of the target areas. Further, the imaging area includes at least an area on a center side of the surface to be treated and an area on an outer circumferential side of the surface to be treated as the target areas.
Public/Granted literature
- US20190096720A1 SUBSTRATE TREATMENT DEVICE AND SUBSTRATE TREATMENT METHOD Public/Granted day:2019-03-28
Information query
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