There is provided a production method of a capacitor structure, having the following steps: forming a bottom electrode on a substrate; forming a sacrificial layer, which covers at least one part of the bottom electrode, on the substrate; forming a top electrode, which traverses the bottom electrode and covers at least one part of the sacrificial layer, on the substrate, such that a sacrificial layer is present at a part where an orthographic projection of the top electrode on the substrate and an orthographic projection of the bottom electrode on the substrate overlap; removing the sacrificial layer with a sacrificial layer removing solution to form an air gap. There are also provided a capacitor structure and a sensor.