Invention Grant
- Patent Title: Method for producing an optoelectronic semiconductor component and optoelectronic semiconductor component
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Application No.: US15759972Application Date: 2016-10-04
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Publication No.: US10651338B2Publication Date: 2020-05-12
- Inventor: Dominik Scholz
- Applicant: OSRAM OLED GMBH
- Applicant Address: DE Regensburg
- Assignee: OSRAM OLED GmbH
- Current Assignee: OSRAM OLED GmbH
- Current Assignee Address: DE Regensburg
- Agency: Slater Matsil, LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@143c39da
- International Application: PCT/EP2016/073642 WO 20161004
- International Announcement: WO2017/060223 WO 20170413
- Main IPC: H01L33/00
- IPC: H01L33/00 ; H01L31/0203 ; H01L31/0304 ; H01L31/18 ; H01L33/32 ; H01L33/54 ; H01L21/683 ; H01L31/0352 ; H01L33/06 ; H01L33/62

Abstract:
A method for fabricating an optoelectronic semiconductor component is disclosed. A semiconductor chip is produced by singularizing a wafer. The semiconductor chip comprises a substrate and a semiconductor layer sequence with an active layer applied to a main side of the substrate. The semiconductor layer sequence has an active region for emission or absorption of radiation and a sacrificial region arranged next to the active region. The sacrificial region in the finished semiconductor component is not intended to emit or absorb radiation. A trench, introduced into the semiconductor layer sequence, penetrates the active layer and separates the active region from the sacrificial region. The semiconductor chip with the semiconductor layer sequence is applied on a carrier. The substrate is detached from the active region of the semiconductor layer sequence. In the sacrificial region, the semiconductor layer sequence remains mechanically connected to the substrate.
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