Invention Grant
- Patent Title: Method for producing a nano-gap in a brittle film assisted by a stabilizing substrate
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Application No.: US14860599Application Date: 2015-09-21
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Publication No.: US10656137B2Publication Date: 2020-05-19
- Inventor: Ethan Pfeiffer
- Applicant: Ethan Pfeiffer
- Agency: Spradley PLLC
- Agent Michael Spradley
- Main IPC: G01N33/487
- IPC: G01N33/487 ; G01N27/414 ; B82Y40/00
Abstract:
This application discloses a method for developing a conductive nano-gap. The first step can comprise depositing a brittle material on a substrate. Next, a conductive graphene layer can be deposited at the surface of the brittle material. Lastly, a crack can be propagated through the brittle material and the graphene using a force, the crack a nano-gap.
Public/Granted literature
- US20170082598A1 Method for Producing a Nano-gap in a Brittle Film Assisted by a Stabilizing Substrate Public/Granted day:2017-03-23
Information query
