Invention Grant
- Patent Title: Semiconductor manufacturing apparatus
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Application No.: US15695819Application Date: 2017-09-05
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Publication No.: US10658162B2Publication Date: 2020-05-19
- Inventor: Tatsumi Usami
- Applicant: TOSHIBA MEMORY CORPORATION
- Applicant Address: JP Tokyo
- Assignee: TOSHIBA MEMORY CORPORATION
- Current Assignee: TOSHIBA MEMORY CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Foley & Lardner LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@7f278c89
- Main IPC: C23C14/34
- IPC: C23C14/34 ; H01J37/34 ; H01L21/203 ; C23C14/35

Abstract:
A semiconductor manufacturing apparatus includes a vacuum chamber, a rotary member, a first magnet, a second magnet, and a magnetic body. The vacuum chamber contains a substrate and a target located opposite to the substrate. The rotary member has a first surface located on a back side of the target outside the vacuum chamber. The first magnet is provided on the first surface. The second magnet has a magnetic pole opposite to a magnetic pole of the first magnet and is provided on an inner side of the first magnet on the first surface. The magnetic body is provided between the first magnet and the second magnet and is configured to be movable backward and forward in a vertical direction.
Public/Granted literature
- US20180261437A1 SEMICONDUCTOR MANUFACTURING APPARATUS Public/Granted day:2018-09-13
Information query
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