Invention Grant
- Patent Title: Wafer laminate, method for production thereof, and adhesive composition for wafer laminate
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Application No.: US15728846Application Date: 2017-10-10
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Publication No.: US10658314B2Publication Date: 2020-05-19
- Inventor: Hiroyuki Yasuda , Michihiro Sugo , Hideto Kato
- Applicant: Shin-Etsu Chemical Co., Ltd.
- Applicant Address: JP Tokyo
- Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@550232f2
- Main IPC: B32B7/06
- IPC: B32B7/06 ; H01L21/683 ; C08G77/50 ; B32B15/08 ; B32B17/06 ; C08G77/52 ; B32B7/12 ; H01L23/00 ; B32B27/26 ; B32B27/28 ; B32B38/10 ; B32B27/20 ; B32B27/18 ; B32B27/24 ; B32B37/12 ; C09J163/00 ; B32B27/08 ; C09J183/10 ; B32B37/02 ; C08G77/00 ; B32B38/00 ; B32B37/00

Abstract:
Disclosed herein is a wafer laminate suitable for production of thin wafers and a method for producing the wafer laminate. The wafer laminate can be formed easily by bonding between the support and the wafer and it can be easily separated from each other. It promotes the productivity of thin wafers.The wafer laminate includes a support, an adhesive layer formed on the support, and a wafer which is laminated on the adhesive layer in such a way that that surface of the wafer which has the circuit surface faces toward the adhesive layer, wherein the adhesive layer is a cured product of an adhesive composition composed of resin A and resin B, the resin A having the light blocking effect and the resin B having the siloxane skeleton.
Public/Granted literature
- US20180102333A1 WAFER LAMINATE, METHOD FOR PRODUCTION THEREOF, AND ADHESIVE COMPOSITION FOR WAFER LAMINATE Public/Granted day:2018-04-12
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