Invention Grant
- Patent Title: Semiconductor element and method of manufacturing the same
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Application No.: US16260721Application Date: 2019-01-29
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Publication No.: US10658466B2Publication Date: 2020-05-19
- Inventor: Masao Uchida
- Applicant: Panasonic Intellectual Property Management Co., Ltd.
- Applicant Address: JP Osaka
- Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Current Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Current Assignee Address: JP Osaka
- Agency: McDermott Will & Emery LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@7a92baf4
- Main IPC: H01L29/16
- IPC: H01L29/16 ; H01L29/06 ; H01L29/24 ; H01L29/08 ; H01L29/66 ; H01L29/872

Abstract:
A semiconductor element includes: a semiconductor substrate of a first conduction type; a silicon carbide semiconductor layer of the first conduction type disposed above a principal surface of the semiconductor substrate; a terminal edge region of a second conduction type disposed in the silicon carbide semiconductor layer; an insulating film; a first electrode disposed on the silicon carbide semiconductor layer; and a seal ring surrounding the first electrode. The terminal edge region is disposed to surround part of a surface of the silicon carbide semiconductor layer when viewed in a normal direction of the principal surface of the semiconductor substrate. The terminal edge region includes a guard ring region of the second conduction type, and a terminal edge injection region of the second conduction type. The seal ring is formed on the terminal edge injection region through an opening disposed on the insulating film.
Public/Granted literature
- US20190245043A1 SEMICONDUCTOR ELEMENT AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2019-08-08
Information query
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