Invention Grant
- Patent Title: Semiconductor device and manufacturing method thereof
-
Application No.: US16162515Application Date: 2018-10-17
-
Publication No.: US10658523B2Publication Date: 2020-05-19
- Inventor: Shigeto Honda , Fumihito Masuoka , Yuki Haraguchi
- Applicant: Mitsubishi Electric Corporation
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Electric Corporation
- Current Assignee: Mitsubishi Electric Corporation
- Current Assignee Address: JP Tokyo
- Agency: Studebaker & Brackett PC
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@4647babe
- Main IPC: H01L29/861
- IPC: H01L29/861 ; H01L23/498 ; H01L29/06 ; H01L29/36 ; H01L29/66 ; H01L29/16 ; H01L29/20

Abstract:
The semiconductor device according to the present invention includes: an n-type semiconductor substrate; a p-type anode layer provided in a front surface of the n-type semiconductor substrate; an anode electrode provided on the p-type anode layer; and a wire connected to the anode electrode, the p-type anode layer includes: a p+-type anode layer disposed to include a position right under a portion where the wire is connected; and a p−-type anode layer disposed to exclude the position right under the portion where the wire is connected, and an impurity concentration of the p+-type anode layer is higher than an impurity concentration of the p−-type anode layer.
Public/Granted literature
- US20190157466A1 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF Public/Granted day:2019-05-23
Information query
IPC分类: