Invention Grant
- Patent Title: Magnetoresistance effect element and magnetic memory
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Application No.: US16179461Application Date: 2018-11-02
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Publication No.: US10658572B2Publication Date: 2020-05-19
- Inventor: Hideo Sato , Shoji Ikeda , Mathias Bersweiler , Hiroaki Honjo , Kyota Watanabe , Shunsuke Fukami , Fumihiro Matsukura , Kenchi Ito , Masaaki Niwa , Tetsuo Endoh , Hideo Ohno
- Applicant: TOHOKU UNIVERSITY
- Applicant Address: JP Sendai-Shi, Miyagi
- Assignee: TOHOKU UNIVERSITY
- Current Assignee: TOHOKU UNIVERSITY
- Current Assignee Address: JP Sendai-Shi, Miyagi
- Agency: Rabin & Berdo, P.C.
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@52ecd796
- Main IPC: H01L43/08
- IPC: H01L43/08 ; H01L27/22 ; H01F10/16 ; H01F10/32 ; H01L27/105 ; H01L29/82 ; G11C11/16 ; H01L43/10

Abstract:
A magnetoresistance effect element includes first and second magnetic layers having a perpendicular magnetization direction, and a first non-magnetic layer disposed adjacent to the first magnetic layer and on a side opposite to a side on which the second magnetic layer is disposed. An interfacial perpendicular magnetic anisotropy exists at an interface between the first magnetic layer and the first non-magnetic layer, and the anisotropy causes the first magnetic layer to have a magnetization direction perpendicular to the surface of the layers. An atomic fraction of all magnetic elements to all magnetic and non-magnetic elements included in the second magnetic layer is smaller than that of the first magnetic layer.
Public/Granted literature
- US20190074433A1 MAGNETORESISTANCE EFFECT ELEMENT AND MAGNETIC MEMORY Public/Granted day:2019-03-07
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