Invention Grant
- Patent Title: Storage device
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Application No.: US16290546Application Date: 2019-03-01
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Publication No.: US10658579B2Publication Date: 2020-05-19
- Inventor: Kensuke Ota , Yoko Yoshimura , Yoshihiko Moriyama
- Applicant: Toshiba Memory Corporation
- Applicant Address: JP Tokyo
- Assignee: TOSHIBA MEMORY CORPORATION
- Current Assignee: TOSHIBA MEMORY CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Kim & Stewart LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@3acd10d2
- Main IPC: H01L45/00
- IPC: H01L45/00 ; H01L27/24

Abstract:
A storage device includes a first conductive layer and a second conductive layer, with an intermediate layer therebetween. The intermediate layer includes a first and second compound regions. The first compound region includes first and second adjacent portions and the second compound region includes third and fourth adjacent portions. Electrical resistance between the first and second conductive layers changes according to a polarity applied across the intermediate layer. In a first polarity state, a concentration of a first element in the first portion is higher than a concentration of the first element in the second portion of the first compound region. A thickness of the third portion in the first polarity state is greater than the thickness of the fourth portion in the first polarity state.
Public/Granted literature
- US20200020854A1 STORAGE DEVICE Public/Granted day:2020-01-16
Information query
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