Invention Grant
- Patent Title: Alignment apparatus, lithography apparatus, and article manufacturing method
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Application No.: US16227207Application Date: 2018-12-20
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Publication No.: US10659736B2Publication Date: 2020-05-19
- Inventor: Tadaki Miyazaki
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: CANON KABUSHIKI KAISHA
- Current Assignee: CANON KABUSHIKI KAISHA
- Current Assignee Address: JP Tokyo
- Agency: Rossi, Kimms & McDowell LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@2bc842e0
- Main IPC: H04N7/18
- IPC: H04N7/18 ; G03F9/00 ; G03F1/42 ; H04N5/232 ; G06K9/00

Abstract:
An alignment apparatus performs alignment of a substrate is provided. The apparatus comprises a stage that moves while holding a substrate, an imaging device that captures an image of a mark on the substrate, and a processor that obtains a position of the mark based on the image of the mark. The imaging device includes an image sensor and a storage device that stores image data obtained by the image sensor. The imaging device performs next image capturing after the image sensor performs accumulation of charge and transfer of image data to the storage device is completed. The apparatus moves the stage for next image capturing concurrently with transfer of the image data to the storage device when capturing an image of the mark using the imaging device at a plurality of positions while moving the stage.
Public/Granted literature
- US20190199972A1 ALIGNMENT APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD Public/Granted day:2019-06-27
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