Invention Grant
- Patent Title: Anneal chamber with getter
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Application No.: US15651669Application Date: 2017-07-17
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Publication No.: US10661223B2Publication Date: 2020-05-26
- Inventor: Joseph M. Ranish
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson + Sheridan LLP
- Main IPC: B01D53/82
- IPC: B01D53/82 ; H01L21/67 ; H05B3/00 ; B01D53/46 ; B01D53/04 ; B01D53/26
Abstract:
A method and apparatus for thermally processing a substrate is described. The apparatus includes a thermal processing chamber having an interior volume which includes a top portion and a side wall. The apparatus also include a getter assembly comprising a getter configured as a wire disposed in the top portion and extending into the interior volume proximal to the side wall.
Public/Granted literature
- US20180345215A1 ANNEAL CHAMBER WITH GETTER Public/Granted day:2018-12-06
Information query
IPC分类:
