Invention Grant
- Patent Title: Methods for vapor deposition
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Application No.: US16032803Application Date: 2018-07-11
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Publication No.: US10661297B2Publication Date: 2020-05-26
- Inventor: James W. Neal , Kevin W. Schlichting , Brian T. Hazel , David A. Litton , Eric Jorzik , Michael J. Maloney
- Applicant: United Technologies Corporation
- Applicant Address: US CT Farmington
- Assignee: United Technologies Corporation
- Current Assignee: United Technologies Corporation
- Current Assignee Address: US CT Farmington
- Agency: Kinney & Lange, P.A.
- Main IPC: C23C14/24
- IPC: C23C14/24 ; B05B15/62 ; C23C14/50

Abstract:
An embodiment of a method includes retaining a first workpiece and a second workpiece selectively on a workpiece fixture disposed within a deposition chamber. The workpiece fixture includes tooling including a first workpiece holder, a second workpiece holder, and a first hollow wall. The first workpiece is separated from the second workpiece using the first hollow wall. Energy is selectively applied and directed within the deposition chamber, from an energy source toward a first crucible, the first crucible including a plurality of walls defining an upper recess contiguous with, and disposed directly above a first lower recess, at least the upper recess open to an interior of the deposition chamber. During the step of selectively applying and directing energy, a gas valve is controlled to maintain a partial vacuum in the deposition chamber of greater than 2 Pa to control a size and overlap of at least one coating zone formed around each of the at least one workpiece.
Public/Granted literature
- US20180318866A1 METHODS FOR VAPOR DEPOSITION Public/Granted day:2018-11-08
Information query
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