Invention Grant
- Patent Title: Test pattern creation method, test pattern, printing apparatus, and program
-
Application No.: US15899817Application Date: 2018-02-20
-
Publication No.: US10661587B2Publication Date: 2020-05-26
- Inventor: Masashi Kanai
- Applicant: SEIKO EPSON CORPORATION
- Applicant Address: JP Tokyo
- Assignee: SEIKO EPSON CORPORATION
- Current Assignee: SEIKO EPSON CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Foley & Lardner LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@21ef0df6
- Main IPC: B41J29/393
- IPC: B41J29/393 ; B41J2/14 ; B41J2/155 ; B41J2/21 ; B41J2/045

Abstract:
A method for creating a test pattern includes creating a reference ruled line set by ejecting ink from a nozzle formed in a first print tip among a plurality of print tips, and creating a measurement ruled line set by ejecting ink from a nozzle formed in a second print tip among the plurality of print tips. A ruled line in the reference ruled line set and a ruled line in the measurement ruled line set whose positions align in a secondary scan direction when no impact displacement is present in the secondary scan direction are designated as specified ruled lines. The test pattern is created such that spacings between the ruled lines within the reference ruled line set and spacings between the ruled lines within the measurement ruled line set increase on progression in the secondary scan direction away from the specified ruled lines.
Public/Granted literature
- US20180236800A1 TEST PATTERN CREATION METHOD, TEST PATTERN, PRINTING APPARATUS, AND PROGRAM Public/Granted day:2018-08-23
Information query
IPC分类: