Invention Grant
- Patent Title: Mask, method for manufacturing the same, and mask assembly
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Application No.: US15745338Application Date: 2017-06-13
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Publication No.: US10662519B2Publication Date: 2020-05-26
- Inventor: Zhiming Lin , Zhen Wang
- Applicant: BOE Technology Group Co., Ltd. , Ordos Yuansheng Optoelectronics Co., Ltd.
- Applicant Address: CN Beijing CN Ordos, Inner Mongolia
- Assignee: BOE TECHNOLOGY GROUP CO., LTD.,ORDOS YUANSHENG OPTOELECTRONICS CO., LTD.
- Current Assignee: BOE TECHNOLOGY GROUP CO., LTD.,ORDOS YUANSHENG OPTOELECTRONICS CO., LTD.
- Current Assignee Address: CN Beijing CN Ordos, Inner Mongolia
- Agency: Westman, Champlin & Koehler, P.A.
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@30313d14
- International Application: PCT/CN2017/088040 WO 20170613
- International Announcement: WO2018/019045 WO 20180201
- Main IPC: C23C14/04
- IPC: C23C14/04 ; B05C21/00 ; H01L51/56 ; C23C14/24 ; H01L51/00
Abstract:
A mask, a method for manufacturing a mask, and a mask assembly are disclosed. The mask includes an effective region for evaporation and an edge region between an edge of the effective region for evaporation extending in a stretching direction and an edge of the mask extending in the stretching direction. The edge region is provided with a bending relieving structure for relieving a curling of the edge of the effective region for evaporation when the mask is stretched in the stretching direction.
Public/Granted literature
- US20190010601A1 MASK, METHOD FOR MANUFACTURING THE SAME, AND MASK ASSEMBLY Public/Granted day:2019-01-10
Information query
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