- Patent Title: Method and precision nanopositioning apparatus with compact vertical and horizontal linear nanopositioning flexure stages for implementing enhanced nanopositioning performance
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Application No.: US15662086Application Date: 2017-07-27
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Publication No.: US10663040B2Publication Date: 2020-05-26
- Inventor: Deming Shu , Barry Lai , Steven P. Kearney , Jayson W. Anton , Wenjun Liu , Jorg M. Maser , Christian Roehrig , Jonathan Z. Tischler
- Applicant: UChicago Argonne, LLC
- Applicant Address: US IL Chicago
- Assignee: UChicago Argonne, LLC
- Current Assignee: UChicago Argonne, LLC
- Current Assignee Address: US IL Chicago
- Agent Joan Pennington
- Main IPC: F16H21/04
- IPC: F16H21/04 ; H02N2/02 ; H02N2/04

Abstract:
An enhanced method and precision nanopositioning apparatus for implementing enhanced nanopositioning performance is provided. The nanopositioning apparatus includes a vertical linear nanopositioning flexure stage and a horizontal linear nanopositioning flexure stage. The vertical linear nanopositioning flexure stage includes a stage base, a symmetrically configured flexure linear guiding mechanism with precision motion enhancement structure, and a stage carriage. The horizontal linear nanopositioning flexure stage is mounted on the stage carriage of the vertical linear nanopositioning flexure stage, and includes a middle-bar relative position control mechanism to enhance the stiffness of a flexure linear guiding mechanism.
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