Invention Grant
- Patent Title: Mask and fabrication method thereof
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Application No.: US15548832Application Date: 2017-02-22
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Publication No.: US10663857B2Publication Date: 2020-05-26
- Inventor: Shouhua Lv , Baojun Li
- Applicant: BOE TECHNOLOGY GROUP CO., LTD. , ORDOS YUANSHENG OPTOELECTRONICS CO., LTD.
- Applicant Address: CN Beijing CN Ordos, Inner Mongolia
- Assignee: BOE TECHNOLOGY GROUP CO., LTD.,ORDOS YUANSHENG OPTOELECTRONICS CO., LTD.
- Current Assignee: BOE TECHNOLOGY GROUP CO., LTD.,ORDOS YUANSHENG OPTOELECTRONICS CO., LTD.
- Current Assignee Address: CN Beijing CN Ordos, Inner Mongolia
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@396c2cf2
- International Application: PCT/CN2017/074403 WO 20170222
- International Announcement: WO2018/014554 WO 20180125
- Main IPC: G03F1/64
- IPC: G03F1/64 ; H01L51/00 ; H01L51/50 ; C23C14/04 ; G03F1/50 ; B05C21/00

Abstract:
A mask and a fabrication method thereof are provided. The mask includes: a frame, which includes a hollow portion and a border surrounding the hollow portion; an opening plate, which is provided on the frame and includes an opening and a body surrounding the opening, the opening corresponding to the hollow portion, and the body being connected with the border; and a pattern plate, which is provided on the opening plate and includes a pattern portion and a non-pattern portion positioned in a periphery of the pattern portion, the pattern portion corresponding to the opening, the non-pattern portion being connected with the body of the opening plate, and the non-pattern portion and the frame being separated from each other at a position of the border.
Public/Granted literature
- US20180239241A1 MASK AND FABRICATION METHOD THEREOF Public/Granted day:2018-08-23
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