Invention Grant
- Patent Title: Photoresist recycling apparatus
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Application No.: US16408205Application Date: 2019-05-09
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Publication No.: US10663865B2Publication Date: 2020-05-26
- Inventor: Chia-Ren Lin , Penny Hung , Hung-Chen Lin
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: G03B13/00
- IPC: G03B13/00 ; G03F7/30

Abstract:
A method for removing air micro-bubbles from photoresist used to purge a new photoresist filter is disclosed. The method includes flowing photoresist through a photoresist filter to remove air trapped in the photoresist filter, where the trapped air forms air micro-bubbles in the photoresist; collecting, in a buffer tank, the photoresist with air micro-bubbles; removing, in the buffer tank, the air micro-bubbles from the photoresist; and transferring the photoresist without air micro-bubbles from the buffer tank to photolithography equipment.
Public/Granted literature
- US20200004157A1 PHOTORESIST RECYCLING APPARATUS Public/Granted day:2020-01-02
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