Invention Grant
- Patent Title: Semiconductor structure having a composite barrier layer
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Application No.: US15798180Application Date: 2017-10-30
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Publication No.: US10665556B2Publication Date: 2020-05-26
- Inventor: Chun-Yu Wu , Yu-Wei Shang , Chung-Ruei Kang
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agent Maschoff Brennan
- Main IPC: H01L23/00
- IPC: H01L23/00 ; H01L23/498 ; H01L23/532 ; H01L23/31 ; H01L23/525

Abstract:
A mechanism of a semiconductor structure with composite barrier layer under redistribution layer is provided. A semiconductor structure includes a substrate comprising a top metal layer on the substrate; a passivation layer over the top metal layer having an opening therein exposing the top metal layer; a composite barrier layer over the passivation layer and the opening, the composite barrier layer includes a center layer, a bottom layer, and an upper layer, wherein the bottom layer and the upper layer sandwich the center layer; and a redistribution layer (RDL) over the composite barrier layer and electrically connecting the underlying top metal layer.
Public/Granted literature
- US20180068963A1 SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF Public/Granted day:2018-03-08
Information query
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