Invention Grant
- Patent Title: Selection device for use in bipolar resistive memory and manufacturing method therefor
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Application No.: US16085400Application Date: 2016-03-18
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Publication No.: US10665780B2Publication Date: 2020-05-26
- Inventor: Ming Liu , Qing Luo , Xiaoxin Xu , Hangbing Lv , Shibing Long , Qi Liu
- Applicant: INSTITUTE OF MICROELECTRONICS, CHINESE ACADEMY OF SCIENCES
- Applicant Address: CN Beijing
- Assignee: INSTITUTE OF MICROELECTRONICS, CHINESE ACADEMY OF SCIENCES
- Current Assignee: INSTITUTE OF MICROELECTRONICS, CHINESE ACADEMY OF SCIENCES
- Current Assignee Address: CN Beijing
- Agency: Goodwin Procter LLP
- International Application: PCT/CN2016/076667 WO 20160318
- International Announcement: WO2017/156755 WO 20170921
- Main IPC: H01L29/51
- IPC: H01L29/51 ; H01L45/00 ; H01L27/24 ; G11C13/00 ; G11C11/56

Abstract:
A selector for a bipolar resistive random access memory and a method for fabricating the selector are provided. The method includes: providing a substrate; forming a lower electrode on the substrate, where the lower electrode is made of a metal, and the metal is made up of metal atoms which diffuse under an annealing condition of below 400° C.; forming a first metal oxide layer on the lower electrode; performing an annealing process on the first metal oxide layer to make the metal atoms in the lower electrode diffuse into the first metal oxide layer to form a first metal oxide layer doped with metal atoms; forming a second metal oxide layer on the first metal oxide layer doped with metal atoms; forming an upper electrode layer on the second metal oxide layer; and patterning the upper electrode layer to form an upper electrode.
Public/Granted literature
- US20190115529A1 SELECTION DEVICE FOR USE IN BIPOLAR RESISTIVE MEMORY AND MANUFACTURING METHOD THEREFOR Public/Granted day:2019-04-18
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