Invention Grant
- Patent Title: Substrate cleaning device, substrate processing apparatus and substrate cleaning method
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Application No.: US15697775Application Date: 2017-09-07
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Publication No.: US10668591B2Publication Date: 2020-06-02
- Inventor: Hiromi Murachi , Ryuichi Yoshida , Koji Nishiyama , Toru Momma , Chikara Sagae
- Applicant: SCREEN HOLDINGS CO., LTD.
- Applicant Address: JP
- Assignee: SCREEN Holdings Co., Ltd.
- Current Assignee: SCREEN Holdings Co., Ltd.
- Current Assignee Address: JP
- Agency: Ostrolenk Faber LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@334e51b6
- Main IPC: B24B29/02
- IPC: B24B29/02 ; H01L21/67 ; B08B11/02 ; B08B3/02 ; B08B1/02 ; B08B1/00 ; B08B7/04
Abstract:
A rotating substrate is cleaned by a polishing head and a cleaning brush. A first trajectory is formed by movement of the polishing head along a first path. A second trajectory is formed by movement of the cleaning brush along a second path. A region in which the first and second paths overlap with each other is defined as an interference region. The polishing head moves from a center towards an outer peripheral end of the substrate, and it is determined whether the polishing head has moved out of the interference region. At a time point at which it is determined that the polishing head has moved out of the interference region, the cleaning brush starts moving from the outer peripheral end towards the center of the substrate.
Public/Granted literature
- US20180071884A1 SUBSTRATE CLEANING DEVICE, SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE CLEANING METHOD Public/Granted day:2018-03-15
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