Invention Grant
- Patent Title: Processing system and processing method
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Application No.: US15922160Application Date: 2018-03-15
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Publication No.: US10669626B2Publication Date: 2020-06-02
- Inventor: Shinya Sato
- Applicant: Kabushiki Kaisha Toshiba , Toshiba Electronic Devices & Storage Corporation
- Applicant Address: JP Tokyo JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba,Toshiba Electronic Devices & Storage Corporation
- Current Assignee: Kabushiki Kaisha Toshiba,Toshiba Electronic Devices & Storage Corporation
- Current Assignee Address: JP Tokyo JP Tokyo
- Agency: White & Case LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@358d17dc
- Main IPC: B08B3/00
- IPC: B08B3/00 ; C23C16/44 ; C23C16/24 ; C23C16/02 ; C23C16/455 ; H01L21/67 ; H01L21/02

Abstract:
According to one embodiment, a processing system includes a first vessel, a destination part to be transported, and a liquid sending part. The first vessel gathers a product being liquid temporarily. The destination part to be transported includes a second vessel to gather the product transported from the first vessel. The liquid sending part includes a first portion. The first portion includes a nozzle and a first mechanism. The nozzle discharges the product provided between the first vessel and the destination part to be transported. The first mechanism is purged by an inactive gas.
Public/Granted literature
- US20180371611A1 PROCESSING SYSTEM AND PROCESSING METHOD Public/Granted day:2018-12-27
Information query