Invention Grant
- Patent Title: Processing apparatus
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Application No.: US15347289Application Date: 2016-11-09
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Publication No.: US10669632B2Publication Date: 2020-06-02
- Inventor: Masahiro Kikuchi , Tsuneyuki Okabe
- Applicant: TOKYO ELECTRON LIMITED
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Nath, Goldberg & Meyer
- Agent Jerald L. Meyer
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@76709d82
- Main IPC: C23C16/40
- IPC: C23C16/40 ; C23C16/455 ; C23C16/44

Abstract:
A processing apparatus includes a processing container, a manifold having an injector supporting part, the injector supporting part being disposed at a lower end of the processing container, extending along an inner wall surface in the processing container and having an insertion hole, and a gas introduction part having a gas flow passage within the gas introduction part to communicate with the insertion hole and an outside of the processing container so that a gas flows in the gas flow passage, an injector inserted and fixed into the insertion hole, the injector entirely extending in a linear manner along the wall surface and having an opening communicating with the gas flow passage at a location where the injector is inserted into the insertion hole, and a gas supplying pipe communicating with and connected to an outer end of the gas flow passage of the gas introduction part.
Public/Granted literature
- US20170137942A1 PROCESSING APPARATUS Public/Granted day:2017-05-18
Information query
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