Invention Grant
- Patent Title: Method and apparatus for exposing a structure on a substrate
-
Application No.: US14304665Application Date: 2014-06-13
-
Publication No.: US10670972B2Publication Date: 2020-06-02
- Inventor: Rudolf Zelsacher , Peter Irsigler
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Slater Matsil, LLP
- Main IPC: G03B27/32
- IPC: G03B27/32 ; G03F7/20
Abstract:
A method for exposing a structure on a substrate includes positioning of an invariable reticle and a programmable reticle in a light path between a light source and a layer on a substrate to be exposed to light and exposing the layer on the substrate by light from the light source passing the invariable reticle and the programmable reticle.
Public/Granted literature
- US20150362841A1 Method and Apparatus for Exposing a Structure on a Substrate Public/Granted day:2015-12-17
Information query
