Invention Grant
- Patent Title: Adjustment of a metrology apparatus or a measurement thereby based on a characteristic of a target measured
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Application No.: US16061209Application Date: 2016-11-29
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Publication No.: US10670975B2Publication Date: 2020-06-02
- Inventor: Robert John Socha , Arie Jeffrey Den Boef , Nitesh Pandey
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- International Application: PCT/EP2016/079105 WO 20161129
- International Announcement: WO2017/102304 WO 20170622
- Main IPC: G06F17/00
- IPC: G06F17/00 ; G01N21/55 ; G03F7/20 ; G01N21/956 ; G01B11/27 ; G01N21/88
Abstract:
A method of adjusting a metrology apparatus, the method including: spatially dividing an intensity distribution of a pupil plane of the metrology apparatus into a plurality of pixels; and reducing an effect of a structural asymmetry in a target on a measurement by the metrology apparatus on the target, by adjusting intensities of the plurality of pixels.
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