Invention Grant
- Patent Title: Substrate inspection method and system
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Application No.: US15554041Application Date: 2016-01-29
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Publication No.: US10672116B2Publication Date: 2020-06-02
- Inventor: Seung Ae Seo , Yeon Hee Lee , Won Mi Ahn , Hye In Lee , Jong Hui Lee
- Applicant: KOH YOUNG TECHNOLOGY INC.
- Applicant Address: KR Seoul
- Assignee: KOH YOUNG TECHNOLOGY INC.
- Current Assignee: KOH YOUNG TECHNOLOGY INC.
- Current Assignee Address: KR Seoul
- Agency: Kile Park Reed & Houtteman PLLC
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@1240e4b2 com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@269ce023
- International Application: PCT/KR2016/000997 WO 20160129
- International Announcement: WO2016/137130 WO 20160901
- Main IPC: G06K9/00
- IPC: G06K9/00 ; G06T7/00 ; G06T7/62 ; G06T7/521 ; G06T7/11 ; G06T7/174 ; G06T17/00 ; G01N21/956

Abstract:
A substrate inspection system and substrate inspection method for setting an inspection region having a three-dimensional shape and/or a two-dimensional arbitrary shape as a region of interest on an image of a substrate. The substrate inspection method includes: generating and displaying a 2D image of a substrate based on image data acquired from the substrate having an inspection object; receiving first input information including arbitrary point data or line data for setting a region of interest at a plurality of particular positions of the 2D image from a user; and displaying the region of interest corresponding to the point data or the line data as a 2D region of interest having an arbitrary shape in accordance with the first input information.
Public/Granted literature
- US20180040118A1 SUBSTRATE INSPECTION METHOD AND SYSTEM Public/Granted day:2018-02-08
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