Invention Grant
- Patent Title: R-T-B based permanent magnet
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Application No.: US15440660Application Date: 2017-02-23
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Publication No.: US10672546B2Publication Date: 2020-06-02
- Inventor: Masashi Miwa , Takurou Iwasa , Tamotsu Ishiyama
- Applicant: TDK CORPORATION
- Applicant Address: JP Tokyo
- Assignee: TDK CORPORATION
- Current Assignee: TDK CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@1d15f0e7
- Main IPC: H01F1/057
- IPC: H01F1/057 ; B22F9/04 ; B22F3/16 ; B22F3/24 ; C22C33/02 ; C22C33/04 ; C22C38/00 ; C22C38/06 ; C22C38/10 ; C22C38/14

Abstract:
An R-T-B based permanent magnet includes main phase grains composed of R2T14B type compound. R is a rare earth element. T is iron group element(s) essentially including Fe or Fe and Co. B is boron. The magnet contains at least C, Ga, and M selected from Zr, Ti, and Nb in addition to R, T, and B. B is contained at 0.71 mass % to 0.88 mass %. C is contained at 0.15 mass % to 0.34 mass %. Ga is contained at 0.40 mass % to 1.40 mass %. M is contained at 0.25 mass % to 2.50 mass %. A formula (1) of 0.14≤[C]/([B]+[C])≤0.30 and a formula (2) of 5.0≤[B]+[C]−[M]≤5.6 are satisfied, where [B], [C], and [M] are respectively a content of B, C, and M by atom %.
Public/Granted literature
- US20170250015A1 R-T-B BASED PERMANENT MAGNET Public/Granted day:2017-08-31
Information query
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