Invention Grant
- Patent Title: Array substrate, method for fabricating array substrate and display
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Application No.: US16313224Application Date: 2018-11-01
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Publication No.: US10672797B2Publication Date: 2020-06-02
- Inventor: Chuan Wu
- Applicant: CHONGQING HKC OPTOELECTRONICS TECHNOLOGY CO., LTD. , HKC CORPORATION LIMITED
- Applicant Address: CN Chongqing CN Shenzhen, Guangdong
- Assignee: CHONGQING HKC OPTOELECTRONICS TECHNOLOGY CO., LTD.,HKC CORPORATION LIMITED
- Current Assignee: CHONGQING HKC OPTOELECTRONICS TECHNOLOGY CO., LTD.,HKC CORPORATION LIMITED
- Current Assignee Address: CN Chongqing CN Shenzhen, Guangdong
- Agency: Law Offices of Albert Wai-Kit Chan, PLLC
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@2e802f51
- International Application: PCT/CN2018/113389 WO 20181101
- Main IPC: H01L27/12
- IPC: H01L27/12 ; H01L29/786 ; G02F1/1368 ; H01L29/66 ; H01L27/32
Abstract:
The array substrate includes: a substrate; a gate electrode; a gate insulating layer; an active layer; a source-drain electrode; a passivation layer; a pixel electrode; the active layer includes a first silicon layer, and the first silicon layer disposed below the channel is composed of polycrystalline silicon, and the remaining part of the first silicon layer is composed of amorphous silicon.
Public/Granted literature
- US20200105796A1 ARRAY SUBSTRATE, METHOD FOR FABRICATING ARRAY SUBSTRATE AND DISPLAY Public/Granted day:2020-04-02
Information query
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