Invention Grant
- Patent Title: Methods for producing light extraction structures for semiconductor devices
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Application No.: US15843758Application Date: 2017-12-15
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Publication No.: US10672948B2Publication Date: 2020-06-02
- Inventor: Joo Won Choi , Chen Chen
- Applicant: Saphlux, Inc.
- Applicant Address: US CT Branford
- Assignee: Saphlux, Inc.
- Current Assignee: Saphlux, Inc.
- Current Assignee Address: US CT Branford
- Main IPC: H01L33/00
- IPC: H01L33/00 ; H01L33/10 ; H01L33/06 ; H01L33/32

Abstract:
Aspects of the disclosure provide for mechanisms for fabricating light extraction structures for semiconductor devices (e.g., light-emitting devices). In accordance with some embodiments, a semiconductor device is provided. The semiconductor device may include: a first semiconductor layer including an epitaxial layer of a semiconductor material; a second semiconductor layer comprising an active layer; and a light-reflection layer configured to cause at least a portion of light produced by the active layer to emerge from the semiconductor device via a surface of the second semiconductor layer, wherein the light-reflection layer is positioned between the first semiconductor layer and the second semiconductor layer. In some embodiments, the semiconductor material includes gallium nitride. In some embodiments, the light-reflection layer includes a layer of gallium.
Public/Granted literature
- US20190189843A1 LIGHT EXTRACTION STRUCTURES FOR SEMICONDUCTOR DEVICES Public/Granted day:2019-06-20
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