Invention Grant
- Patent Title: Magnetic tunnel junction with reduced damage
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Application No.: US15894656Application Date: 2018-02-12
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Publication No.: US10672975B2Publication Date: 2020-06-02
- Inventor: Carlos H. Diaz , Harry-Hak-Lay Chuang , Ru-Liang Lee
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee Address: TW Hsin-Chu
- Agency: Haynes and Boone, LLP
- Main IPC: H01L43/02
- IPC: H01L43/02 ; H01L43/08 ; H01L27/22 ; H01L43/12 ; H01L21/302

Abstract:
A device includes a metal layer comprising a plurality of bottom electrode features. The device further includes a Magnetic Tunnel Junction (MTJ) stack layer comprising a plurality of MTJ stack features, each of the MTJ stack features disposed on a top surface of one of the plurality of bottom electrode features. The device further includes sidewall structures that extend along side surfaces of both the bottom electrode features and the MTJ stack features.
Public/Granted literature
- US20180166623A1 MAGNETIC TUNNEL JUNCTION WITH REDUCED DAMAGE Public/Granted day:2018-06-14
Information query
IPC分类: