• Patent Title: Perpendicular magnetoresistive elements
  • Application No.: US14063204
    Application Date: 2013-10-25
  • Publication No.: US10672977B2
    Publication Date: 2020-06-02
  • Inventor: Yimin Guo
  • Applicant: Yimin Guo
  • Main IPC: H01L43/10
  • IPC: H01L43/10 H01L43/08
Perpendicular magnetoresistive elements
Abstract:
A perpendicular magnetoresistive element includes a novel recording layer being a multi-layer comprising a first Co-alloy layer including at least one of CoFeB, CoFeB/CoFe and CoFe/CoFeB, a second Co-alloy layer including at least one of CoFeB and CoB, an insertion layer provided between the first Co-alloy layer and the second Co-alloy layer and containing at least one element selected from Zr, Nb, W, Mo, Ru and having a thickness less than 0.5 nm, and a novel buffer layer having rocksalt crystal structure(s) interfacing to the recording layer with lattice parameter mismatch between 3% and 18%. The magnetoresistive element is annealed at an elevated temperature and both the first Co-alloy layer and the second Co-alloy layer are crystallized to form body-center cubic (bcc) CoFe or bcc Co grain having epitaxial growth with (100) plane parallel to substrate and with in-plane expansion and out-of-plane contraction.
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