Invention Grant
- Patent Title: Target expansion rate control in an extreme ultraviolet light source
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Application No.: US16391890Application Date: 2019-04-23
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Publication No.: US10674591B2Publication Date: 2020-06-02
- Inventor: Daniel Jason Riggs , Robert Jay Rafac
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: DiBerardino McGovern IP Group LLC
- Main IPC: H05G2/00
- IPC: H05G2/00

Abstract:
A method includes providing a target material that comprises a component that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first beam of radiation toward the target material to deliver energy to the target material to modify a geometric distribution of the target material to form a modified target; directing a second beam of radiation toward the modified target, the second beam of radiation converting at least part of the modified target to plasma that emits EUV light; measuring one or more characteristics associated with one or more of the target material and the modified target relative to the first beam of radiation; and controlling an amount of radiant exposure delivered to the target material from the first beam of radiation based on the one or more measured characteristics to within a predetermined range of energies.
Public/Granted literature
- US20190254152A1 TARGET EXPANSION RATE CONTROL IN AN EXTREME ULTRAVIOLET LIGHT SOURCE Public/Granted day:2019-08-15
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